• 離開悲傷之後
  • Record Type: Language materials, printed : monographic
    Author: 胡佛
    Secondary Intellectual Responsibility: 盧秋瑩,
    Place of Publication: 臺北市
    Published: 三采文化;
    Year of Publication: 2013[民102]
    Edition: 初版
    Description: 295面21公分;
    Series: iREAD
    Subject: 美國小說 -
    ISBN: 9789863420156
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